名称和标识符别名信息物化性质安全信息国际标准相关数据海关数据生产方法和用途相关文献专业数据库参考参考资料相关分类相关产品

三(三甲基硅基)硅烷 | 1873-77-4

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中文名称：三(三甲基硅基)硅烷

英文名称： Tris(trimethylsilyl)silane)

CAS No.： 1873-77-4

分子式： C₉H₂₈Si₄

分子量： 248.660626411438

如需查看该化合物的详细结构式,mol文件,smile,InChi 请点击：三(三甲基硅基)硅烷结构式

MSDS：三(三甲基硅基)硅烷MSDS

PubChem CID： 24861995

价格行情：三(三甲基硅基)硅烷价格

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三(三甲基硅基)硅烷的其他展现形式

相关化合物

Trisilane, 2,2-bis(dimethylsilyl)-1,1,1,3,3-pentamethyl-

CAS No.：186499-88-7

名称和标识符

MDL	MFCD00077893
InChIKey	SQMFULTZZQBFBM-UHFFFAOYSA-N
Inchi	1S/C9H28Si4/c1-11(2,3)10(12(4,5)6)13(7,8)9/h10H,1-9H3
SMILES	[Si](C)(C)(C)[SiH]([Si](C)(C)C)[Si](C)(C)C
BRN	1923953

别名信息

- 中文别名 -

三(三甲基硅基)硅烷
三(三甲硅基)硅烷
三(三甲硅烷基)硅烷
1,1,1,3,3,3-五甲基-2-(三甲基甲硅烷基)三硅烷
3-氨基吡咯烷-1-羧酸叔丁酯

1,1-硫代羰基二咪唑
三(三甲硅基)硅烷(含稳定剂TBBP)[还原试剂]
三(三甲基硅)硅烷(含稳定剂3,3',5,5'-四叔丁基-4,4'-二羟基联苯)[还原试剂]
三(三甲硅烷基)硅烷,97%
三(三甲基硅基)硅烷 1KG

- 英文别名 -

1,1,1,3,3,3-Hexamethyl-2-(trimethylsilyl)trisilane
TRIS(TRIMETHYLSILYL)SILANE-D
TTMSS
1,1,1,3,3-HEXAMETHYL-2-TRIMETHYLSILYL-TRISILANE
Tris(trimethylsilyl)silane (stabilized with TBBP) [Reducing Reagent]

Tris(trimethylsilyl)silane
Tris(trimethylsilyl)
Tris(trimethylsilyl)silane)
1,1'-ThiocarbonyldiiMidazole
Tri(trimethylsilyl)silane
Tris(trimethylsilyl)silane [Reducing Reagent]
1,1-Bis(trimethylsilyl)-2,2,2-trimethyldisilane
Tris(trimethylsilyl)silane,96%
TRIS(TRIMETHYLSILYL)SILANE 97+%
TRIS(TRIMETHYLSILYL)SILANE 96%
TRIS(TRIMETHYLSILYL)SILANE
1,1,1,3,3,3-HEXAMETHYL-2-(TRIMETHYLSILYL)TRISILANE

物化性质

实验特性

LogP	3.46330
PSA	0.00000
Merck	14,9757
折射率	n20/D 1.489(lit.)
水溶性	Miscible with pentane, ether, toluene and tetrahydrofuran. Sparingly miscible with acetone and acetonitrile. Immiscible with water.
沸点	73 °C/5 mmHg(lit.)
熔点	No data available
蒸气压	No data available
闪点	华氏：131 °F 摄氏：55 °C
颜色与性状	无色-微浅黄色透明液体
溶解性	Miscible with pentane, ether, toluene and tetrahydrofuran. Sparingly miscible with acetone and acetonitrile. Immiscible with water.
敏感性	Light Sensitive
密度	0.806 g/mL at 25 °C(lit.)

计算特性

精确分子量	248.12700
氢键供体数量	0
氢键受体数量	0
可旋转化学键数量	3
同位素质量	247.119
重原子数量	13
复杂度	134
同位素原子数量	0
确定原子立构中心数量	0
不确定原子立构中心数量	0
确定化学键立构中心数量	0
不确定化学键立构中心数量	0
共价键单元数量	1
表面电荷	0
拓扑分子极性表面积	0

安全信息

符号：	GHS02 GHS07
WGK Germany	3
安全术语	3
安全说明	S16-S26-S36
包装等级	II
包装类别	II
风险术语	R10
危险等级	3
危险品标志	Xi
危险品运输编号	UN 1993 3/PG 3
危害声明	H226,H315,H319,H335
警示性声明	P261,P305+P351+P338
储存条件	充氩保存
PackingGroup	II
危险类别码	10-36/37/38
信号词	Warning
TSCA	No
HazardClass	3
FLUKA BRAND F CODES	10-23

国际标准相关数据

EINECS	MFCD00077893

海关数据

海关编码	2931900090
海关数据	中国海关编码： 2931900090 概述： 2931900090. 其他有机-无机化合物. 增值税率:17.0%. 退税率:13.0%. 监管条件:AB(入境货物通关单,出境货物通关单). 最惠国关税:6.5%. 普通关税:30.0% Summary： 2931900090. other organo-inorganic compounds. VAT:17.0%. Tax rebate rate:13.0%. Supervision conditions:AB(certificate of inspection for goods inward,certificate of inspection for goods outward). MFN tariff:6.5%. General tariff:30.0%

海关编码

2931900090

海关数据

中国海关编码：

2931900090

概述：

2931900090. 其他有机-无机化合物. 增值税率:17.0%. 退税率:13.0%. 监管条件:AB(入境货物通关单,出境货物通关单). 最惠国关税:6.5%. 普通关税:30.0%

Summary：

2931900090. other organo-inorganic compounds. VAT:17.0%. Tax rebate rate:13.0%. Supervision conditions:AB(certificate of inspection for goods inward,certificate of inspection for goods outward). MFN tariff:6.5%. General tariff:30.0%

生产方法和用途

用途	还原试剂

相关文献

1. Highly efficient UV-Vis light activated three-component photoinitiators composed of tris(trimethylsilyl)silane for polymerization of acrylates
Alicja Balcerak,Dominika Kwiatkowska,Katarzyna Iwińska,Janina Kabatc Polym. Chem. 2020 11 5500
2. Catalyst free removal of trithiocarbonate RAFT CTAs from poly(vinylpyridine)s using tris(trimethylsilyl)silane and light
Brandon A. Fultz,Drake Beery,Brianna M. Coia,Kenneth Hanson,Justin G. Kennemur Polym. Chem. 2020 11 5962
3. Temperature-controlled Mukaiyama aldol reaction of cyclododecanone (CDD) with aromatic aldehydes promoted by TMSCl via the (TMS)3Si intermediate generated in situ
Venkatesan Sathesh,Kulathu I. Sathiyanarayanan New J. Chem. 2016 40 3833
4. Silyl-mediated photoredox-catalyzed radical–radical cross-coupling reaction of alkyl bromides and ketoesters
Hao-Luo Jiang,Yu-Hao Yang,Ya-Nan Zhao,Yan-Hong He,Zhi Guan Org. Chem. Front. 2022 9 6611
5. Cross-coupling of sulfonic acid derivatives via aryl-radical transfer (ART) using TTMSS or photoredox
Eric D. Nacsa,Tristan H. Lambert Org. Chem. Front. 2018 5 64
6. Synthesis of poly(vinylidene fluoride–trifluoroethylene) via a controlled silyl radical reduction of poly(vinylidene fluoride–chlorotrifluoroethylene)
Wanwan Zhang,Jian Wang,Pin Gao,Shaobo Tan,Weiwei Zhu,Zhicheng Zhang J. Mater. Chem. C 2017 5 6433
7. Intramolecular radical cyclization approach to access highly substituted indolines and 2,3-dihydrobenzofurans under visible-light
Clarice A. D. Caiuby,Akbar Ali,Vinicius T. Santana,Francisco W. de S. Lucas,Marilia S. Santos,Arlene G. Corrêa,Otaciro R. Nascimento,Hao Jiang,Márcio W. Paix?o RSC Adv. 2018 8 12879
8. Recent progress in the development of highly active dyeing photoinitiators based on 1,3-bis(p-substituted phenylamino)squaraines for radical polymerization of acrylates
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9. Visible light initiating systems for photopolymerization: status, development and challenges
Jianzhong Shao,Yi Huang,Qinguo Fan Polym. Chem. 2014 5 4195
10. Generation of alkoxysulfonyl radicals from chlorosulfates and their intramolecular capture with alkynes to obtain sultones
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专业数据库参考

PubChemId	24861995

参考资料

Reaxys RN
Beilstein	1923953

三(三甲基硅基)硅烷 | 1873-77-4

中国海关编码：

概述：

Summary：

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